Раздел 3 Первое занятие

129

The deposition of layers is followed by shaping operations, such as etching, to form the required outlines⁶². Alternatively, the film can be deposited through a mask onto the substrate to define the outlines directly.

In this way many identical thin-film devices can be made on a single sheet of material, which then are cut apart to yield individual devices.

Plasma etching, which is expected to play an important role in manufacture of semiconductor and other devices requiring fine-line lithography, involves the use of a glow discharge to generate reactive species⁶³ from relatively inert molecular gases. These reactive species combine chemically with certain solid materials to form volatile⁶⁴ com­pounds which are then removed by vacuum pumping system.

This plasma-etching process has been shown to have important advantages in terms of cost, cleanliness, fine-line resolution, and po­tential for production line automation.

Additionally, the inside of a water-fabrication must be extremely clean and orderly: a single particle happens to cause a defect that will result in the malfunction of a circuit. The larger the die⁶⁵, the greater the chance for a defect.

The structure of an integrated circuit is sure to be complex both in the topology of its surface and in its internal composition. Each el­ement of such a device has intricate⁶⁶ three-dimensional architecture that must be reproduced exactly in every circuit. The structure is made up of many layers, each of which is a detailed pattern. Some of the layers lie within the silicon wafer and others are stacked⁶⁷ on the top. The manufacturing process consists in forming the sequence of layers precisely in accordance with the plan of the circuit designer.

Nowadays much of the procedure by which ICs are transformed from the conception of the circuit designer to a physical reality is done with the aid⁶⁸ of computers. In the first stage of the development of new microelectronic circuits the designers themselves used to work at specifying the functional characteristics of the device. They also se­lected the processing steps that will be required to manufacture it. The process was difficult and not always exact. A computer can simulate⁶⁹ the operations of the circuit. Besides, computer simulation is less ex­pensive than assembling a “bread-board” (макет) circuit made up of discrete circuit elements; it is also more accurate.

9 Бух

Микроэлектроника настоящее и будущее

The layout is known to specify the pattern of each layer of the IC. The goal of the layout is to achieve the desired function of each circuil in the smallest possible space. At present much of the preliminary (предварительный) work is done with the aid of computers. The fi­nal layout is also made with that of a computer.

Increasing interest in submicron layer now poses new problems. New developments in materials are believed to be due⁷⁰ to new manu­facturing forms and vice versa.

Integrated circuit technology is evolving so rapidly that even a period as short as six months can produce a significant change.

3. Проверьте, как вы запомнили слова.

   6. Переведите выделенные слова, исходя из значений, приведенных в скобках:

1. process v (обрабатывать), processing л, processor л

2. substance п (вещество), substantially adv, substantiate v

3. intermediate a (промежуточный), intermediately adv, medium л

4. expenditure л (расход, трата), expend v, expense л, expensive a

5. similar a (одинаковый), similarity л, simulate v

6. add v (прибавлять), additional a, addition л, adder л

7. vapour л (nap), vaporize v, vaporous a, vaporizer л

8. transfer v (передавать), transferable a\ transference л

9. precise a (точный), precisely adv, precision л

10. dissolve v (растворять), dissolvable a, dissolvent л, solution л

11. prevent v (мешать), prevention л, preventive a

12. harmful a (вредный), harm л, harmless a

13. advance v (двигаться вперед), advance л, advanced a

14. establish v (устанавливать), establishment n

15. deposition n (осадок), deposit v, pose v, impose v

16. volatile a (летучий), volatility n, volatilize v

17. term n (термин), terminal л, terminate v, in terms

18. specify v (определять), specification л, specific a

19. major a (главный), majority л

6. Определите значения английских слов, исходя из контекста:

1. строго defined параметры

2. processing of металла может быть холодной