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Файл:МУ ИУ4 ч.1 Шишкина Румянцева Units 1-4.docx
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- •Часть 1
- •Preliminary exercises
- •Preliminary Operations
- •Words to be learnt
- •Exercises:
- •Epitaxy
- •Thermal Oxidation
- •Terminology:
- •Preliminary exercises
- •Diffusion methods
- •The Process of Doping in Diffusion Furnaces
- •Masking
- •Words to be remembered:
- •Grammar Revision
- •As far as, whatever, since, moreover, hence, thus, because of, due to, thanks to
- •Thin Film Deposition
- •Words to be remembered
- •Electrolytic deposition
- •The film fabrication method
- •Vacuum deposition
- •Cathode sputtering
- •Ion plasma sputtering
- •Chemical vapor deposition
- •Anodizing
- •Thermal
- •Electron beam
- •Rc circuits resistors;
- •Capacitors
- •Dielectric for capacitors resistors insulator
- •Capacitors, resistors, switching elements
- •Protective coats, dielectric of capacitors
The film fabrication method
Vacuum deposition
Cathode sputtering
Ion plasma sputtering
Chemical vapor deposition
Anodizing
Thermal
Electron beam
Rc circuits resistors;
Capacitors
Dielectric for capacitors resistors insulator
Capacitors, resistors, switching elements
Protective coats, dielectric of capacitors
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